1. In high temperature environment, it does not deform and has large chip loadinccapacity;

2.Resistant to extreme cold and heat, long service life;

3. The thermal expansion coefficient of cantilever slurry is very small, which greatlyprolongsthe maintenance and cleaning cycle, and greatly reduces pollutants;

4. Length from 1500 to 4000 mm can be customized according to customerrequirements:

5.CVD coating can be made for some size products according to customerrequirements to reduce metal impurities;
In the process of coating polycrystalline siliconwafer or monocrystalline silicon wafer in diffusionfurnace, the loading and conveying function of siliconwafer in high temperature environment(1000-1300C)is the key component of semiconductor waferloading system.